Improving semiconductor shower head performance with simulation
Thursday, May 11, 2017

The shower head is a critical part of a chemical vapour deposition (CVD) chamber, distributing gases properly to ensure uniformity of deposition rates across the wafer. The shower head typically consists of a large number of small holes through which the gas is delivered over the surface of the wafer. Precise control of flow speed, temperature and gas species distribution is critical, so a well-designed shower head provides higher quality deposition as well as increased wafer throughput.

This On-Demand webinar will explore the usage of simulation to improve the design of a shower head. The baseline shower head design will first be virtually tested, and then a wide range of design options will be automatically explored to improve the selected performance criteria subject to defined constraints. Finally, options for increasing the complexity of the physics simulated will be explained, allowing the simulations to progress from virtual design testing to virtual operation.

Ruben Bons
Colin Haye
Speaker Company: 
Siemens PLM Software